Other articles related with "contact resistance":
27304 Shu-Xing Zhou(周书星), Li-Kun Ai(艾立鹍), Ming Qi(齐鸣), An-Huai Xu(徐安怀), Jia-Sheng Yan(颜家圣), Shu-Sen Li(李树森), and Zhi Jin(金智)
  Characterization of low-resistance ohmic contacts to heavily carbon-doped n-type InGaAsBi films treated by rapid thermal annealing
    Chin. Phys. B   2021 Vol.30 (2): 27304-0 [Abstract] (368) [HTML 1 KB] [PDF 615 KB] (74)
114401 Huilong Yan(闫慧龙), Jinliang Yan(闫金良), Gang Zhao(赵刚)
  Heat transfer of liquid metal alloy on copper plate deposited with film of different surface free energy
    Chin. Phys. B   2019 Vol.28 (11): 114401-114401 [Abstract] (717) [HTML 1 KB] [PDF 661 KB] (175)
118501 M Micjan, M Novota, P Telek, M Donoval, M Weis
  Hunting down the ohmic contact of organic field-effect transistor
    Chin. Phys. B   2019 Vol.28 (11): 118501-118501 [Abstract] (564) [HTML 1 KB] [PDF 579 KB] (115)
37305 Pan Dai(代盼), Jianya Lu(卢建娅), Ming Tan(谭明), Qingsong Wang(王青松), Yuanyuan Wu(吴渊渊), Lian Ji(季莲), Lifeng Bian(边历峰), Shulong Lu(陆书龙), Hui Yang(杨辉)
  Transparent conducting indium-tin-oxide (ITO) film as full front electrode in III-V compound solar cell
    Chin. Phys. B   2017 Vol.26 (3): 37305-037305 [Abstract] (874) [HTML 1 KB] [PDF 327 KB] (555)
118101 Shu-Zhen Yu(于淑珍), Yan Song(宋焱), Jian-Rong Dong(董建荣), Yu-Run Sun(孙玉润), Yong-Ming Zhao(赵勇明), Yang He(何洋)
  Low specific contact resistivity to graphene achieved by AuGe/Ni/Au and annealing process
    Chin. Phys. B   2016 Vol.25 (11): 118101-118101 [Abstract] (666) [HTML 0 KB] [PDF 438 KB] (379)
78103 Da-cheng Mao(毛达诚), Zhi Jin(金智), Shao-qing Wang(王少青), Da-yong Zhang(张大勇), Jing-yuan Shi(史敬元), Song-ang Peng(彭松昂), Xuan-yun Wang(王选芸)
  Depositing aluminum as sacrificial metal to reduce metal-graphene contact resistance
    Chin. Phys. B   2016 Vol.25 (7): 78103-078103 [Abstract] (649) [HTML 1 KB] [PDF 1257 KB] (352)
57306 Chen-Fei Wu(武辰飞), Yun-Feng Chen(陈允峰), Hai Lu(陆海), Xiao-Ming Huang(黄晓明), Fang-Fang Ren(任芳芳), Dun-Jun Chen(陈敦军), Rong Zhang(张荣), You-Dou Zheng(郑有炓)
  Contact resistance asymmetry of amorphous indium-gallium-zinc-oxide thin-film transistors by scanning Kelvin probe microscopy
    Chin. Phys. B   2016 Vol.25 (5): 57306-057306 [Abstract] (697) [HTML 1 KB] [PDF 654 KB] (564)
76601 Li Rui (李睿), Guo Chun-Sheng (郭春生), Feng Shi-Wei (冯士维), Shi Lei (石磊), Zhu Hui (朱慧), Wang Lin (王琳)
  Nondestructive measurement of thermal contact resistance for the power vertical double-diffused metal-oxide-semiconductor
    Chin. Phys. B   2015 Vol.24 (7): 76601-076601 [Abstract] (546) [HTML 1 KB] [PDF 238 KB] (344)
98502 Wu Shuang-Hong (吴双红), Ryosuke Nakamichi, Masatsugu Taneda, Zhang Qi-Sheng (张其胜), Chihaya Adachi
  Introduction of F4-TCNQ/MoO3 layers for thermoelectric devices based on pentacene
    Chin. Phys. B   2014 Vol.23 (9): 98502-098502 [Abstract] (906) [HTML 1 KB] [PDF 229 KB] (588)
66803 Dai Chong-Chong (代冲冲), Liu Xue-Chao (刘学超), Zhou Tian-Yu (周天宇), Zhuo Shi-Yi (卓世异), Shi Biao (石彪), Shi Er-Wei (施尔畏)
  Effects of annealing temperature on the electrical property and microstructure of aluminum contact on n-type 3C-SiC
    Chin. Phys. B   2014 Vol.23 (6): 66803-066803 [Abstract] (532) [HTML 1 KB] [PDF 717 KB] (322)
117307 Yu Xin-Ge (于欣格), Yu Jun-Sheng (于军胜), Huang Wei (黄伟), Zeng Hong-Juan (曾红娟 )
  Enhanced charge carrier injection in heterojunction organic field-effect transistor by inserting an MoO3 buffer layer
    Chin. Phys. B   2012 Vol.21 (11): 117307-117307 [Abstract] (1038) [HTML 1 KB] [PDF 410 KB] (723)
88103 Wei Qin-Qin (魏芹芹), Wei Zi-Jun (魏子钧), Ren Li-Ming (任黎明), Zhao Hua-Bo (赵华波), Ye Tian-Yang (叶天扬), Shi Zu-Jin (施祖进), Fu Yun-Yi (傅云义), Zhang Xing (张兴), Huang Ru (黄如)
  Vertical assembly of carbon nanotubes for via interconnects
    Chin. Phys. B   2012 Vol.21 (8): 88103-088103 [Abstract] (1329) [HTML 1 KB] [PDF 13760 KB] (750)
47205 Huang Jun-Yi(黄俊毅), Fan Guang-Han(范广涵), Zheng Shu-Wen(郑树文), Niu Qiao-Li(牛巧利), Li Shu-Ti(李述体), Cao Jian-Xing(曹健兴), Su Jun(苏军), and Zhang Yong(章勇)
  Improvement of the light output and contact resistance of InGaN-based light-emitting diodes based on tantalum-doped indium tin oxide as p-type electrodes
    Chin. Phys. B   2010 Vol.19 (4): 47205-047205 [Abstract] (1526) [HTML 1 KB] [PDF 459 KB] (1784)
2142 Guo Hui(郭辉), Zhang Yi-Men(张义门), and Zhang Yu-Ming(张玉明)
  Ti--Al based ohmic contacts to n-type 6H-SiC with P+ ion implantation
    Chin. Phys. B   2006 Vol.15 (9): 2142-2145 [Abstract] (1127) [HTML 1 KB] [PDF 262 KB] (726)
First page | Previous Page | Next Page | Last PagePage 1 of 1